Chemical solution vaporizing tank and chemical solution treating system
AssigneeTokyo Electron Limited
InventorsKouichi Mizunaga, Hiroyuki Kudoh, Kazuhiko Ooshima
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AssigneeTokyo Electron Limited
InventorsKouichi Mizunaga, Hiroyuki Kudoh, Kazuhiko Ooshima
Estimating the term…
An object is to suppress differences in concentration between processing gases supplied to a plurality of works in a chemical solution vaporizing tank. The chemical solution vaporizing tank includes a tank body having a plurality of vaporizing chambers formed by laterally and airtightly partitioning an internal space of the tank body, a chemical solution passage located under a liquid level in each vaporizing chamber and formed at each partition member for passing the chemical solution between the vaporizing chambers, and a gas passage located above the liquid level in each vaporizing chamber and formed at the partition member to communicate the vaporizing chambers with each other for uniformizing pressures in the respective vaporizing chambers. A quantity of the channel layer in each vaporizing chamber is controlled by managing, e.g., the liquid level.
A chemical solution vaporizing tank for producing a processing gas by supplying a vaporization gas to a chemical solution stored in the chemical solution vaporizing tank, and supplying the processing gas to a work for performing processing, comprising:
Dependencies are inferred from the claim text.