Optical system having a clearning arrangement
AssigneeKoninklijke Philips Electronics N.V.
InventorsPeter Zink, Gunther Hans Debra
Life of this patent
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Abstract
A cleaning arrangement for an optical system and in particular for an optical system designed for EUV radiation. The cleaning arrangement has a gas inlet (28) for a reactive gas (29). Contaminants (23) that have deposited on the surface of optical elements (110) are detached by the reactive gas. Also provided are getter surfaces (32) that are preferably arranged opposite the surfaces to be clean and by which the contaminants detached from these surfaces are absorbed. This absorption may take place as a result of condensation on the getter surface and also by chemical reaction.
Claims19
An optical system (100), in particular for EUV radiation, having a beam path (118) defined by optical elements (110, 113) and having a cleaning arrangement comprising a reactive-gas inlet (28) and at least one getter surface (32) arranged off the beam path (118).
A cleaning arrangement for use in an optical system, in particular an optical system (100) designed for EUV radiation, having a reactive-gas inlet (28) that is aimed at the surfaces (13, 20) to be cleaned and having a getter surface (14, 32) for absorbing the contaminants (23).
A method of cleaning a surface, wherein the surface to be cleaned (13, 20) has applied to it a reactive gas (28) for detaching the contaminants (24) from the surface, and wherein the contaminants (31) which are detached are absorbed by getter surfaces (32) by condensation and/or by chemical reaction.
Dependencies are inferred from the claim text.