Plate, apparatus for adjusting temperature of substrate having the plate and apparatus for processing substrate having the plate
AssigneeSemes Co., Ltd.
InventorsChang-Suk Oh, Hyun-Kyung Kim
Life of this patent
Estimating the term…
Abstract
In a plate for adjusting a temperature of a substrate, a body of the plate supports the substrate. A first channel and a second channel are disposed within the body of the plate. The first channel has a first inlet and a first outlet and passes therethrough a first fluid to adjust the temperature of the substrate. The second channel has a second inlet adjacent to the first outlet and a second outlet adjacent to the first inlet and passes therethrough a second fluid to adjust the temperature of the substrate. Further, the first and second channels are disposed side by side. Thus, the temperature of the substrate may be adjusted uniformly as a whole.
Claims20
A plate for adjusting a temperature of a substrate, the plate comprising:
- a body for supporting the substrate;
- a first channel disposed within the body, the first channel having a first inlet and a first outlet and passing a first fluid therethrough to adjust the temperature of the substrate;
- and
- a second channel disposed within the body, the second channel having a second inlet adjacent to the first outlet and a second outlet adjacent to the first inlet and passing a second fluid therethrough to adjust the temperature of the substrate.
An apparatus for adjusting a temperature of a substrate, the apparatus comprising:
- a plate comprising:
- a body for supporting the substrate;
- a first channel disposed within the body, the first channel having a first inlet and a first outlet and passing a first fluid therethrough to adjust the temperature of the substrate;
- and
- a second channel disposed within the body, the second channel having a second inlet adjacent to the first outlet and a second outlet adjacent to the first inlet and passing a second fluid therethrough to adjust the temperature of the substrate;
- and
- a fluid supply section supplying the first fluid and the second fluid to the plate.
An apparatus for processing a substrate, the apparatus comprising:
- a heat-treating unit configured to heat-treat the substrate;
- and
- a temperature-adjusting unit configured to adjust a temperature of the substrate which is heat-treated by the heat-treating unit, the temperature-adjusting unit comprising:
- a plate comprising:
- a body for supporting the substrate;
- a first channel disposed within the body, the first channel having a first inlet and a first outlet and passing a first fluid therethrough to adjust the temperature of the substrate;
- and
- a second channel disposed within the body, the second channel having a second inlet adjacent to the first outlet and a second outlet adjacent to the first inlet and passing a second fluid therethrough to adjust the temperature of the substrate;
- and
- a fluid supply section supplying the first fluid and the second fluid to the plate.
Dependencies are inferred from the claim text.