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US 2009/0014323 A1Published application
High temperature cathode for plasma etching
OwnerBoris Yendler, Alexander Matyushkin +2inventors
InventorsBoris Yendler, Alexander Matyushkin, Denis Koosau, Glen Egami
Life of this patent
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Abstract
The present invention generally is a cathode suitable for use in high temperature plasma etch applications. In one embodiment, the cathode includes a ceramic electrostatic chuck secured to a base. The base has cooling conduits formed therein. A rigid support ring is disposed between the chuck and the base, thereby maintaining the chuck and the base in a spaced-apart relation.
Claims20
A plasma processing cathode comprising:
- a base having cooling conduits formed therein;
- a ceramic electrostatic chuck secured to the base;
- and
- a rigid support ring disposed between the electrostatic chuck and the base, the support ring maintaining the electrostatic chuck to the base in a spaced-apart relation.
1 more element
A plasma processing cathode comprising:
- a base having cooling conduits formed therein;
- a ceramic electrostatic chuck disposed on the base, the electrostatic chuck having a plurality of gas feeds extending from a bottom surface of the electrostatic chuck facing the base to a top surface the electrostatic chuck;
- a rigid support ring disposed between the electrostatic chuck and the base, the support ring maintaining the bottom of the electrostatic chuck and the base in a spaced-apart relation;
- a fluid distribution ring disposed between the base and the electrostatic chuck, a bottom of the fluid distribution ring spaced from the base to define an annular channel, the fluid distribution ring having a plurality of gas passages configured to direct gas through the fluid distribution ring from the channel to the electrostatic chuck;
- and
- ceramic baffles disposed in the gas passages.
3 more elements
A plasma processing cathode comprising:
- a base having cooling conduits formed therein;
- a ceramic electrostatic chuck secured to a top surface of the base;
- a rigid support ring disposed between the electrostatic chuck and the base, the support ring maintaining a lower surface of the electrostatic chuck spaced-apart from the top surface of the base;
- a flat annular spreader plate disposed radially inward of the support ring in a gap defined between the lower surface of the electrostatic chuck and the upper surface of the base;
- and
- a seal providing seal between the electrostatic chuck and the base outward of the spreader plate, the seal sealingly permitting radial movement of the electrostatic chuck relative to the plate.
3 more elements
Dependencies are inferred from the claim text.