Gas barrier film and organic device using the same
AssigneeFUJIFILM Corporation
InventorsSatoshi AIBA, Yuya AGATA
Life of this patent
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Abstract
A gas barrier film having a gas barrier layer and an antistatic layer containing an acrylic or methacrylic resin obtained by copolymerizing a monomer represented by the formula (1) or an oligomer thereof: (Ac1-L1)m-M-(L2-Ac2) Formula (1) wherein Ac1 and Ac2 represent a (meth)acryloyl group; L1 and L2 represent an alkylene group, an arylene group, etc.; M represents a metal atom; m and n are an integer of 0-6; and the total sum of m and n is 1-6. The gas barrier film has high barrier properties.
Claims10
A gas barrier film comprising an antistatic layer and a gas barrier layer on a flexible supporting substrate, wherein the gas barrier layer comprises at least one inorganic layer, and the antistatic layer comprises an acrylic or methacrylic resin obtained by copolymerizing a monomer represented by the following formula (1) or an oligomer thereof:
- (Ac1-L1)m-M-(L2-Ac2)n Formula (1)
- wherein Ac1 and Ac2 each independently represents an acryloyl group or a methacryloyl group;
- L1 and L2 each independently represents a substituted or unsubstituted alkylene group having from 1 to 18 carbon atoms, a substituted or unsubstituted arylene having from 6 to 18 carbon atoms, an ether group, an imino group, a carbonyl group or a divalent connecting group in which two or more of these groups are bonded in series;
- M represents a metal atom;
- m and n each independently represents an integer of from 0 to 6;
- and the total sum of m and n is from 1 to 6.
Dependencies are inferred from the claim text.