Low Reflection Film and Forming Method

Abstract

A low reflection film and the forming method for making the same are disclosed. The low reflection film includes at least one siloxane resin and a plurality of silicon dioxide particles. The siloxane resin has at least two alkoxylates. The silicon dioxide particles are fixed by the siloxane resin and protrude from the surface of the siloxane resin. The method includes preparing a first solution by adding a first solvent to a mixture of a catalyst and a siloxane resin after sol-gel reaction, preparing a second solution by mixing the first solution with silicon dioxide particles, coating the second solution onto a surface, and performing a drying process to form the low reflection film.

Dependencies are inferred from the claim text.