Stage apparatus, exposure apparatus, and device fabrication method

A stage apparatus comprising:

• a base;
• a first stage and second stage configured to move between a first area and second area on a stage moving surface of the base;
• a first mirror and second mirror respectively arranged on the stages to measure positions of the stages in a first direction parallel to the stage moving surface;
• a first interferometer which is arranged in the first area on the base and configured to measure a position of the first mirror;
• a second interferometer which is arranged in the second area on the base and configured to measure a position of the second mirror;
• a calculation unit configured to calculate a correction value for at least one of a relative position, relative orientation, and relative shape between the first mirror and the second mirror based on the positions of the first mirror and the second mirror, which are measured by the first interferometer and the second interferometer;
• and
• a control unit configured to control one of the first stage and the second stage based on the correction value calculated by the calculation unit.

A stage apparatus comprising:

• a base;
• a first stage and second stage configured to be able to move between a first area and second area on a stage moving surface of the base;
• a first mirror and second mirror respectively arranged on the stages to measure positions of the stages in a first direction parallel to the stage moving surface;
• a first interferometer which is arranged in the first area on the base and configured to measure a position of the first mirror;
• a second interferometer which is arranged in the second area on the base and configured to measure a position of the second mirror;
• a calculation unit configured to calculate a correction value for at least one of a relative position, relative orientation, and relative shape between the first mirror and the second mirror based on the positions of the first mirror and the second mirror, which are measured by the first interferometer and the second interferometer;
• and
• a control unit configured to compare the value calculated by the calculation unit with a threshold value prepared in advance, and send a message indicating an abnormality if the calculated value exceeds the threshold value.