US 2008/0304036 A1 · CATADIOPTRIC IMAGING SYSTEM, EXPOSURE DEVICE, AND DEVICE MANUFACTURING METHOD

Abstract

A catadioptric imaging optical system with a high numerical aperture and including an effective imaging region shaped optimally for use in a batch type exposure apparatus and having an imaging magnification with a small absolute value. The catadioptric imaging optical system includes a dioptric first imaging system, which forms a first intermediate image based on light from the first plane, a second imaging system, which forms a second intermediate image based on light from the first intermediate image, a third dioptric imaging system, which forms a reduced image on the second plane based on light from the second intermediate image, and a deflecting mirror arranged in an optical path extending from the first imaging system to the second imaging system and an optical path extending from the second imaging system to the third imaging system. The first imaging system and the second imaging system provide a composite imaging magnification having an absolute value β12 of less than 0.55, and the third imaging system has an imaging magnification with an absolute value β3 of less than 0.35.

Claims30

Dependent claims

A catadioptric imaging optical system that forms a reduced image of a first plane on a second plane, the catadioptric imaging optical system comprising:

a first imaging system including only refractive optical elements and which forms a first intermediate image based on light from the first plane;
a second imaging system including at least one concave reflection mirror and which forms a second intermediate image based on light from the first intermediate image;
a third imaging system including only refractive optical elements and which forms the reduced image of the first plane on the second plane based on light from the second intermediate image;
and
at least one deflecting mirror arranged in at least either one of an optical path extending from the first imaging system to the second imaging system and an optical path extending from the second imaging system to the third imaging system;
wherein the first imaging system and the second imaging system provide a composite imaging magnification including an absolute value β12 of less than 0.55, and the third imaging system includes an imaging magnification with an absolute value β3 of less than 0.35.

3 more elements

A catadioptric imaging optical system that forms a reduced image of a first plane on a second plane, the catadioptric imaging optical system comprising:

a dioptric first imaging system arranged in an optical path between the first plane and the second plane, with the first imaging system forming a first conjugation position optically conjugated with the first plane;
a second imaging system arranged in an optical path between the first imaging system and the second plane and including at least one concave reflection mirror, with the second imaging system forming a second conjugation position optically conjugated with the first conjugation position;
a dioptric third imaging system arranged in an optical path between the second imaging system and the second plane, with the second imaging system forming a third conjugation position optically conjugated with the second conjugation position;
at least one deflecting mirror arranged in at least either one of an optical path extending between the first imaging system and the second imaging system and an optical path extending between the second imaging system and the third imaging system;
wherein the first imaging system and the second imaging system provide a composite imaging magnification including an absolute value β12 of less than 0.55, and the third imaging system includes an imaging magnification with an absolute value β3 of less than 0.35.

2 more elements

An exposure apparatus comprising:

a catadioptric imaging optical system that projects an image of a predetermined pattern set on a first plane onto a second plane based on light from the predetermined pattern;
a substrate stage which holds a photosensitive substrate positioned at the second plane;
and
a control unit which controls movement of the substrate stage;
wherein the catadioptric imaging optical system includes a deflecting mirror and forms a position optically conjugated with the first plane in an optical path between the first plane and the second plane;
and
the control unit controls the substrate stage in a static state when the image of the pattern is transferred to the photosensitive substrate.

4 more elements

Dependencies are inferred from the claim text.

Catadioptric imaging system, exposure device, and device manufacturing method

Life of this patent

Catadioptric imaging system, exposure device, and device manufacturing method

Life of this patent

Abstract

Claims30