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US 2008/0303029 A1Published application
Structure, Semiconductor Device, Tft Driving Circuit, Panel, Display and Sensor for Maintaining Microstructure, Methods for Fabricating the Structure, the Semiconductor Device, the Tft Driving Circuit, the Panel, the Display and the Sensor
AssigneePanasonic Corporation
InventorsTakahiro Kawashima, Tohru Saitoh, Norihisa Mino
Life of this patent
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Abstract
A method for fabricating a structure according to the present invention includes the steps of: forming a groove in a substrate, dropping a solution in which microstructures such as nanowires are dispersed into the groove and the step of evaporating the solution to arrange the microstructures in the groove in a self-organizing manner.
Claims46
A method for fabricating a structure for holding a microstructure, the method comprising the steps of:
- a) supplying a fluid containing a microstructure having a cylindrical shape in at least one anisotropic groove provided on a substrate;
- and
- b) evaporating the fluid so that the microstructure is arranged so as to extend in a longitudinal direction of said at least one groove.
A structure for holding a microstructure, the structure comprising:
- a substrate having at least one anisotropic groove;
- and
- a microstructure having a cylindrical shape arranged so as to extend in a longitudinal direction of said at least one groove.
The structure of clam 35, wherein the first coating film is a silicon nitride film, and
- wherein the second coating film is a silicon oxide film.
Dependencies are inferred from the claim text.