Array substrate for fringe field switching mode liquid crystal display device and method of fabricating the same

A method of fabricating an array substrate for a fringe field switching mode liquid crystal display device, comprising:

• forming a gate line and a gate electrode on a substrate, the gate electrode connected to the gate line;
• forming a gate insulating layer on the gate line and the gate electrode;
• forming a first semiconductor pattern on the gate insulating layer, a metal pattern on the first semiconductor pattern and a first sub-data line over the gate insulating layer, the first semiconductor pattern corresponding the gate electrode, the metal pattern having an identical end line with the first semiconductor pattern, the first sub-data line connected to the metal pattern and crossing the gate line to define a pixel region;
• forming a first sub-source layer, a first sub-drain layer, a second sub-data line and a pixel electrode, the first sub-source layer and the first sub-drain layer disposed on the metal pattern and spaced apart from each other, the second sub-data line disposed on the first sub-data line, the pixel electrode disposed in the pixel region and extending from the first sub-drain layer;
• etching an exposed portion of the metal pattern between the first sub-source layer and the first sub-drain layer to form a second sub-source layer under the first sub-source layer and a second sub-drain layer under the first sub-drain layer;
• forming a passivation layer on the pixel electrode;
• and
• forming a common electrode on the passivation layer and having at least one opening corresponding to the pixel electrode.