Method and apparatus for inspecting integrated circuit pattern

A sample inspection apparatus comprising:

• a sample stage to place a sample;
• an electron beam optical system, including a first beam source, to irradiate a first electron beam to the sample;
• a deflector to scan the electron beam;
• a detector to detect secondary electrons emitted from the sample;
• and
• a second beam source for irradiating a second beam to the sample,
• wherein the first electron beam is irradiated to a first area of the sample and the second electron beam is irradiated to a second area of the sample at the same time, and
• the sample stage is moved such that the first electron beam is irradiated to the second area of the sample and the second electron beam is irradiated to a third area of the sample at the same time after the first and the second electron beams are irradiated to the first and the second areas at the same time.

A sample inspection apparatus comprising:

• a sample stage to place a sample;
• an electron beam optical system, including a first beam source, to irradiate a first electron beam to the sample;
• a deflector to scan the electron beam;
• a detector to detect secondary electrons emitted from the sample;
• and
• a second beam source for irradiating a second beam to the sample,
• wherein the second beam source is arranged such that an optical axis of the second source is substantially perpendicular to a surface area of the sample stage, and
• the first and the second beam sources are arranged in a position where the first electron beam and the second beam can be irradiated to the sample at the same time.