Alumina-film-polishing composition and chemical mechanical polishing method using the same
AssigneeTDK Corporation
InventorTetsuji Hori
Life of this patent
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Abstract
An alumina-film-polishing composition is for use in chemical mechanical polishing of an object to be polished that includes an alumina film with an irregular surface, so as to planarize the irregular surface. The polishing composition contains an alumina abrasive grain, and a protection-film-forming agent for forming a protection film on the surface of each of the alumina film and the alumina abrasive grain. The protection-film-forming agent is a water-soluble polymer that has a weight average molecular weight within a range of 100 to 1,000,000 and that is obtained by polymerizing a monomer having at least one OH group or COOH group in its molecule.
Claims7
An alumina-film-polishing composition for use in chemical mechanical polishing of an object to be polished, the object including an alumina film with an irregular surface, for planarizing the irregular surface, the composition containing:
- an alumina abrasive grain;
- and
- a protection-film-forming agent for forming a protection film on the surface of each of the alumina film and the alumina abrasive grain,
- the protection-film-forming agent being a water-soluble polymer that has a weight average molecular weight within a range of 100 to 1,000,000 and that is obtained by polymerizing a monomer having at least one OH group or COOH group in its molecule.
A concentrated alumina-film-polishing composition that contains less water compared with an alumina-film-polishing composition in actual use and that is to be diluted by adding water to form the alumina-film-polishing composition,
- the alumina-film-polishing composition being intended for use in chemical mechanical polishing of an object to be polished, the object including an alumina film with an irregular surface, for planarizing the irregular surface, the composition containing:
- an alumina abrasive grain;
- and
- a protection-film-forming agent for forming a protection film on the surface of each of the alumina film and the alumina abrasive grain,
- the protection-film-forming agent being a water-soluble polymer that has a weight average molecular weight within a range of 100 to 1,000,000 and that is obtained by polymerizing a monomer having at least one OH group or COOH group in its molecule.
A chemical mechanical polishing method for polishing an object to be polished, the object including an alumina film with an irregular surface, in the presence of a polishing slurry to thereby planarize the irregular surface,
- the method using an alumina-film-polishing composition as the polishing slurry,
- the alumina-film-polishing composition containing:
- an alumina abrasive grain;
- and
- a protection-film-forming agent for forming a protection film on the surface of each of the alumina film and the alumina abrasive grain,
- the protection-film-forming agent being a water-soluble polymer that has a weight average molecular weight within a range of 100 to 1,000,000 and that is obtained by polymerizing a monomer having at least one OH group or COOH group in its molecule.
Dependencies are inferred from the claim text.