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US 2008/0292989 A1Published application
Positive working photosensitive composition and pattern forming method using the same
AssigneeFUJIFILM Corporation
InventorNaoyuki NISHIKAWA
Life of this patent
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Abstract
A positive working photosensitive composition comprises: (A) a resin having a heterocyclic group containing plural sulfur atoms in a cyclic structure of the heterocyclic group, the resin decomposing by action of an acid to increase its solubility in an alkaline developer; and (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation.
Claims4
A positive working photosensitive composition comprising:
- (A) a resin having a heterocyclic group containing plural sulfur atoms in a cyclic structure of the heterocyclic group, the resin decomposing by action of an acid to increase its solubility in an alkaline developer;
- and
- (B) a compound capable of generating an acid upon irradiation with actinic rays or radiation.
Dependencies are inferred from the claim text.