Method for etching using a multi-layer mask

A computer readable medium containing program instructions for execution on a computer system, which when executed by the computer system, cause the computer system to perform the steps of:

• disposing a substrate comprising a multi-layer mask in a plasma processing system, wherein said multi-layer mask comprises a lithographic layer overlying a second mask layer and wherein said lithographic layer comprises a feature pattern formed therein using a lithographic process, said feature pattern having a first critical dimension (CD);
• establishing a process recipe configured to cause a deposition condition on the sidewalls of said feature pattern as said feature pattern is transferred to said second mask layer, wherein said deposition condition is configured to cause a reduction from said first CD in said lithographic layer to a second CD in said second mask layer
• introducing a process gas to said plasma processing system according to said process recipe;
• forming plasma from said process gas in said plasma processing system according to said process recipe;
• and
• exposing said substrate to said plasma in order to transfer said feature pattern in said lithographic layer to said underlying second mask layer.

A method of dry developing a multi-layer mask on a substrate, comprising:

• forming said multi-layer mask on said substrate, wherein said multi-layer mask comprises a lithographic layer overlying a second mask layer;
• forming a feature pattern in said lithographic layer using a lithographic process, wherein said feature pattern comprises a first critical dimension (CD);
• transferring said feature pattern from said lithographic layer to said second mask layer using a dry plasma etching process, wherein said dry plasma etching process comprises introducing a process gas, forming plasma from said process gas, and exposing said substrate to said plasma;
• and
• during said transferring, reducing said first CD in said lithographic layer to a second CD in said silicon-containing layer.