Method and apparatus for maskless photolithography

A maskless photolithography method for large area photoforming of photosensitive materials comprising:

• a. receiving mask pattern information and alignment information corresponding to a desired pattern to be created on the photosensitive material;
• b. generating mask patterns based on received mask pattern information and alignment information;
• c. providing said mask patterns to a patterned light generator;
• d. generating a patterned light beam;
• e. directing said patterned light beam onto a first exposure area of the photosensitive material;
• f. exposing the first exposure area of the photosensitive material to said gray scale patterned light beam;
• g. providing relative movement of the photosensitive material and the maskless photolithography system to allow exposure of a second exposure area;
• and
• h. repeating steps a-g to sequentially expose the entire surface of the photosensitive material;
• wherein said patterned light beam incident on the photosensitive material photosculpts the photosensitive material to create contiguous patterns by sequential exposure corresponding to said patterned light beam.

A computer system for large scale, maskless photolithography comprising:

• a. a computing device comprising a display, a central processing unit (CPU), operating system software, memory for storing data, a user interface, and input/output capability for reading and writing data;
• said computing device operably connected to and operating in conjunction with a maskless patterned light generator;
• b. computer program code for:
• 1) receiving mask pattern information and alignment information corresponding to a desired pattern to be created on a photosensive method;
• 2) generating mask patterns based on received mask pattern information and alignment information;
• and
• 3) providing said mask patterns to a maskless pattern generator;
• whereby said computing device operates in conjunction with said maskless photolithography system and executes said computer code to sequentially provide mask patterns to said maskless pattern generator.