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US 2008/0289764 A1Published application
End point detection electrode system and etch station
AssigneeInternational Business Machines Corporation
InventorsErik D. Berridge, Kirk G. Berridge, Camille P. Bowne, David A. Drotar
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Abstract
An end point detection electrode system and an etch station including the electrode system are disclosed. In one embodiment, the electrode system includes: an insulative mount; a first Mu-metal electrode coupled to the insulative mount; and a second Mu-metal electrode coupled to the insulative mount, the second electrode surrounding the first electrode.
Claims6
An end point detection electrode system comprising:
- an insulative mount;
- a first Mu-metal electrode coupled to the insulative mount;
- and
- a second Mu-metal electrode coupled to the insulative mount, the second Mu-metal electrode surrounding the first Mu-metal electrode.
1 more element
An etch station comprising:
- a wet etchant bath;
- an end point detection electrode system including:
- an insulative mount, a first Mu-metal electrode coupled to the insulative mount, and a second Mu-metal electrode coupled to the insulative mount, the second electrode surrounding the first electrode;
- and
- means for monitoring an electrical characteristic between the first Mu-metal electrode and the second Mu-metal electrode and controlling the etching process based on the monitoring.
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Dependencies are inferred from the claim text.