Substrate Cleaning Apparatus and Method for Determining Timing of Replacement of Cleaning Member
AssigneeEbara Corporation
InventorSatomi Hamada
Life of this patent
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AssigneeEbara Corporation
InventorSatomi Hamada
Estimating the term…
A substrate cleaning apparatus comprises a cleaning apparatus 10 including an abutting member 14 which is pressed against a cleaning member 2 to clean the cleaning member 2, a drive control means 21 for controllably driving the abutting member 14 and a cleaning tank 12 which contains a cleaning liquid 11 and allows a portion of abutment between the cleaning member 2 and the abutting member 14 to be impregnated with the cleaning liquid 11. The substrate cleaning apparatus also comprises an image capturing means 16 which captures a surface image of the cleaning member 2 and an image processing means 17. A surface condition of the cleaning member 2 is monitored to determine the timing of replacement of the cleaning member 2. The substrate cleaning apparatus further comprises a measurement means 13 which measures the number of particles and/or a concentration of a component in the cleaning liquid 11 in the cleaning tank 12. Results of measurement by the measurement means 13 are fed back to a drive control means 21, to thereby prevent contamination of the cleaning member 2.
A method for determining timing of replacement of a cleaning member provided in a substrate cleaning apparatus in which the cleaning member is abutted against a substrate to effect scrub cleaning of the substrate,
A method for determining timing of replacement of a cleaning member provided in a substrate cleaning apparatus in which the cleaning member is abutted against a substrate to effect scrub cleaning of the substrate,
A substrate cleaning apparatus comprising a cleaning member, the cleaning member being adapted to be abutted against a substrate to effect scrub cleaning of the substrate,
A substrate cleaning apparatus comprising:
Dependencies are inferred from the claim text.