Patterning methods

A method of patterning a material, comprising:

• forming a masking layer over the material;
• providing a template comprising patterned catalytic material, the catalytic material comprising one or both of CdS and CdSe;
• utilizing the catalytic material to modify some regions of the masking layer while leaving other regions unmodified;
• removing a portion of the masking layer while leaving another portion remaining over the material;
• the removed portion being one of the modified and unmodified regions, and the remaining portion being the other of the modified and unmodified regions;
• and
• transferring a pattern from the remaining portion into the material.

A method of patterning a plurality of substrates, comprising:

• forming a template pattern comprising one or both of CdS and CdSe;
• providing a plurality of substrates having masking layers thereover;
• utilizing the template pattern to sequentially impart complementary patterns in the masking layers of the substrates;
• the imparting of the patterns comprising utilizing the template pattern to catalytically modify some regions of the masking layers while leaving other regions unmodified;
• removing portions of the masking layers, while leaving other portions remaining;
• the removed portions being either the modified or unmodified regions of the masking layers, and the remaining portions being the other of the modified and unmodified regions of the masking layers;
• and
• utilizing the remaining portions of the masking layers to pattern the substrates.