Lithographic apparatus and method
AssigneeASML Netherlands B.V.
InventorsRobert Kazinczi, Wim Tjibbo Tel
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Abstract
A lithographic method is provided and comprises using an illumination system to provide a beam of radiation having an illumination mode, using a patterning device to impart the radiation beam with a pattern in its cross-section, and projecting the patterned radiation beam onto a plurality of substrates. The illumination mode is adjusted after the radiation beam has been projected onto one or more substrates. The adjustment is arranged to reduce the effect of aberrations due to lens heating on the projected pattern during projection of the pattern onto one or more subsequent substrates.
Claims29
A lithographic method comprising:
- using an illumination system to provide a beam of radiation having an illumination mode;
- imparting the beam of radiation with a pattern in its cross-section;
- projecting the patterned radiation beam onto a plurality of substrates;
- and
- adjusting the illumination mode after the beam has been projected onto one or more substrates, the adjustment being arranged to reduce an effect of aberrations on the pattern due to lens heating during projection of the pattern onto one or more subsequent substrates.
A lithographic apparatus comprising:
- an illumination system for providing a beam of radiation having an illumination mode;
- a support structure for supporting a patterning device, the patterning device serving to impart the beam with a pattern in its cross-section;
- a substrate table for holding a substrate;
- a projection system for projecting the patterned radiation beam onto a target portion of the substrate;
- and
- a controller arranged to control part of the illumination system, the controller being arranged to adjust the illumination mode of the beam after the beam has been projected onto one or more substrates, the adjustment being arranged to reduce an effect of aberration on the pattern due to lens heating during projection of the pattern onto one or more subsequent substrates.
A lithographic method comprising
- using an illumination system to provide a beam of radiation having an illumination mode;
- using a patterning device to impart the radiation beam with a pattern in its cross-section;
- and
- projecting the patterned radiation beam onto a plurality of substrates;
- wherein the illumination mode is adjusted after the radiation beam has been projected onto one or more substrates, the adjustment being arranged to reduce the effect of aberrations due to lens heating on the projected pattern during projection of the pattern onto one or more subsequent substrates.
Dependencies are inferred from the claim text.