Mask Layout Method, and Semiconductor Device and Method for Fabricating the Same
AssigneeDongbu HiTek Co., Ltd.
InventorsSANG HEE LEE, Gab Hwan Cho
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Abstract
Provided are a mask layout method and a semiconductor device and a method for fabricating the same. The semiconductor device can include a main pattern, a first dummy pattern, and a second dummy pattern. The main pattern can be disposed on a substrate. The first dummy pattern and the second dummy pattern can be disposed around a side of the main pattern. The first dummy pattern can have an inner open region. The second dummy pattern can be disposed on the inner open region of the first dummy pattern, such that the first dummy pattern surrounds the second dummy pattern.
Claims18
A semiconductor device comprising:
- a main pattern on a substrate;
- a first dummy pattern at a side of the main pattern, the first dummy pattern having an open region;
- and
- a second dummy pattern on the open region of the first dummy pattern.
A method for fabricating a semiconductor device, comprising:
- forming a main pattern on a substrate;
- forming a first dummy pattern including an open space therein, at a side of the main pattern;
- and
- forming a second dummy pattern such that the second dummy pattern is disposed on the open space of the first dummy pattern.
A mask layout method, comprising:
- forming a first dummy pattern including an open space therein;
- and
- forming a second dummy pattern in the open space of the first dummy pattern.
Dependencies are inferred from the claim text.