Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsJohan Hendrik Geerke, Peter Paul Hempenius, Youssef Karel Maria De Vos, Clementius Andreas Johannes Beijers
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Abstract
A lithographic apparatus includes an illumination system configured to condition a radiation beam; a support constructed to support a patterning device, the patterning device being capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam; a substrate table constructed to hold a substrate; a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and a shield device arranged between a source of air flows and/or pressure waves and an element sensitive for the air flows and/or pressure waves.
Claims21
A lithographic apparatus comprising:
- an illumination system configured to condition a radiation beam;
- a support constructed to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
- a substrate table constructed to hold a substrate;
- a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and
- a shield device arranged between a source of air flow and/or pressure wave and an element sensitive to the air flow and/or pressure wave.
A lithographic apparatus comprising:
- an illumination system configured to condition a radiation beam;
- a support constructed to support a patterning device, the patterning device capable of imparting the radiation beam with a pattern in its cross-section to form a patterned radiation beam;
- a substrate table constructed to hold a substrate;
- a projection system configured to project the patterned radiation beam onto a target portion of the substrate, and
- a shield device arranged between the projection system and the support or the substrate table.
A method of shielding a lithographic apparatus element sensitive to air flow and/or pressure wave in the environment of the element, the method comprising providing a shield device between the element and a source of air flow and/or pressure wave.
A device manufacturing method comprising:
- projecting a patterned beam of radiation onto a target portion of a substrate with a lithographic apparatus;
- and
- during the projecting, shielding an element of the lithographic apparatus sensitive to air flow and/or pressure wave from a source of air flow and/or pressure wave.
Dependencies are inferred from the claim text.