Lithographic apparatus and device manufacturing method
AssigneeASML Netherlands B.V.
InventorsBob Streefkerk, Sjoerd Nicolaas Lambertus Donders, Roelof Frederik De Graaf, Christiaan Alexander Hoogendam, Martinus Hendrikus Antonius Leenders, Jeroen Johannes Sophia Maria Meatens, Michel Riepen
Life of this patent
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Abstract
An immersion lithographic apparatus has adaptations to prevent or reduce bubble formation in one or more gaps in the substrate table by preventing bubbles escaping from the gap into the beam path and/or extracting bubbles that may form in the gap.
Claims21
-17. (canceled)
A lithographic apparatus configured to project an image of a desired pattern through a liquid onto a substrate held on a substrate table, there being a groove in a surface of the substrate table or a gap between the substrate table and another component mounted thereon with which the liquid can, in normal use, come into contact, the gap or groove being divided along its length into a plurality of segments.
A lithographic apparatus configured to project an image of a desired pattern through a liquid onto a substrate held on a substrate table, there being a groove in a surface of the substrate table or a gap between the substrate table and another component mounted thereon with which the liquid can, in normal use, come into contact, the apparatus comprising an extractor configured to extract liquid, gas, or both liquid and gas, from the gap or groove.
A lithographic apparatus configured to project an image of a desired pattern through a liquid onto a substrate held on a substrate table, there being a groove in a surface of the substrate table or a gap between the substrate table and another component mounted thereon with which the liquid can, in normal use, come into contact, the apparatus comprising an inlet configured to supply liquid to the gap or groove.
A device manufacturing method in which an image of a desired pattern is projected through a liquid onto a substrate held on a substrate table, there being a groove in a surface of the substrate table or a gap between the substrate table and another component mounted thereon with which the liquid can, in normal use, come into contact, comprising extracting liquid, gas, or both liquid and gas, from the gap or groove.
A device manufacturing method in which an image of a desired pattern is projected through a liquid onto a substrate held on a substrate table, there being a groove in a surface of the substrate table or a gap between the substrate table and another component mounted thereon with which the liquid can, in normal use, come into contact, comprising supplying liquid to the gap or groove.
Dependencies are inferred from the claim text.