Cooling shield for substrate processing chamber
AssigneeApplied Materials, Inc.
InventorsCristopher Mark Pavloff, Kathleen Scheible
Life of this patent
Estimating the term…
Abstract
A process kit comprises an upper shield to encircle a sputtering target in a substrate processing chamber, to reduce deposition of process deposits on the chamber components and the overhanging edge of the substrate. The shield described is of unitary construction with a top ring, support ledge and cylindrical band having a plurality of steps.
Claims42
An upper shield for encircling a sputtering target in a substrate processing chamber, the sputtering target having an inclined perimeter edge, the upper shield comprising:
- (a) a top ring comprising a radially inward bulge, the bulge having an arcuate surface shaped to surround the inclined perimeter edge of the sputtering target;
- (b) a support ledge below the top ring, the support ledge extending radially outward;
- and
- (c) a cylindrical band extending downwardly from the support ledge, the cylindrical band comprising:
- (1) a radially inward surface having a sloped plane and a substantially vertical plane;
- (2) a radially outward surface having a plurality of steps.
A lower shield for placement about an upper shield and a substrate support in a substrate processing chamber, the substrate support having a peripheral edge, the lower shield comprising:
- an annular band extending downwardly into a curved joint;
- and
- an inwardly projecting lip extending horizontally from the curved joint, the inwardly projecting lip comprising a radially inward edge that at least partially surrounds the peripheral edge of the substrate support.
A shield support assembly for placement about a sputtering target, the shield support assembly comprising:
- (a) an upper shield comprising:
- (1) a top ring comprising an inner surface that surrounds a sputtering surface of the sputtering target;
- (2) a support ledge below the top ring, the support ledge extending radially outward and comprising a plurality of protrusions, each protrusion comprising a semicircular shape;
- and
- (3) a cylindrical band extending downwardly from the support ledge;
- (b) an adapter to support the shield, the adapter having at least one cutout shaped and sized to receive at least one of the plurality of protrusions to align the shield to the adapter;
- and
- (c) a plurality of screws to secure the upper shield to the adapter, thereby increasing conductance between the upper shield and the adapter.
A lower shield for placement between an upper shield and sidewall of a substrate processing chamber, and to surround a substrate support having a peripheral edge, the lower shield comprising:
- (a) an annular band having an end;
- (b) an inwardly projecting lip extending radially inwardly from the end of the annular band;
- and
- (c) a radially inward edge extending from the inwardly projecting lip to at least partially surround the peripheral edge of the substrate support.
A lower shield for placement about an upper shield and a substrate support in a substrate processing chamber, the substrate support having a peripheral edge, the lower shield comprising:
- (a) an annular band extending downwardly;
- and
- (b) an inwardly projecting lip extending horizontally from the annular band, the inwardly projecting lip comprising a radially inward edge that at least partially surrounds the peripheral edge of the substrate support.
A cover ring for placement about a substrate support and a deposition ring in a substrate processing chamber, the cover ring comprising:
- (a) a wedge comprising (i) a top surface that extends around the substrate support, and (ii) a projecting brim overlying the deposition ring;
- (b) outer and inner legs extending downwardly from the wedge;
- and
- (c) a footing which rests on the deposition ring to support the cover ring.
Dependencies are inferred from the claim text.