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AssigneePanasonic Corporation
InventorsMasahiro Yamamoto, Takeshi Koiwasaki, Hitoshi Yamanishi, Isao Muragishi, Mitsuhiro Yoshinaga
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Provided is a partial pressure measuring method and a partial pressure measuring apparatus by which a partial pressure distribution is easily measured in a vacuum chamber. The partial pressure measuring method and the partial pressure measuring apparatus includes: moving a local plasma source dedicated to partial pressure measuring provided in the vacuum chamber, to a location at which the measuring is to be performed; and measuring a partial pressure distribution in the vacuum chamber, by receiving emission of plasma generated by the local plasma source through a window which is formed in a wall part of the vacuum chamber and through which the emission passes, and thereby performing emission spectral analysis on intensity of the emission.
A partial pressure measuring method comprising:
A partial pressure measuring method comprising measuring a partial pressure distribution at plurality of locations in a vacuum chamber, by (i) receiving, through a window, emission of plasma generated by each of a plurality of local plasma sources in the vacuum chamber and (ii) performing emission spectral analysis on intensity of the emission regarding each of said plurality of local plasma sources, the window being provided in a wall part of the vacuum chamber and through the window the emission passing.
A partial pressure measuring apparatus comprising:
A partial pressure measuring apparatus comprising:
Dependencies are inferred from the claim text.