Method and System For a Pattern Layout Split

A computer-readable medium having a plurality of instructions stored thereon for splitting a pattern layout into separate masks, the instructions comprising:

• providing a pattern layout having a plurality of features;
• checking the pattern layout with a design rule check (DRC) to determine the features that require splitting;
• coloring the features that require splitting with a first color and a second color;
• resolving coloring conflicts by decomposing the feature with the coloring conflict and coloring the decomposed feature with the first color and the second color;
• and
• forming a first mask with features of the first color and a second mask with features of the second color.

A system for generating multiple masks, the system comprising:

• a pattern layout having a plurality of features;
• and
• a mask writer configured and operable for:
• checking the pattern layout to select the features that require splitting into separate layouts;
• coloring the features that require splitting with a first color and a second color, wherein the first color defines a first layout and the second color defines a second layout;
• resolving coloring conflicts with decomposition, wherein the coloring conflicts occur when adjacent features that require splitting are of the same color;
• equalizing and assigning the features that do not require splitting into the first and second layouts;
• and
• forming a first mask representing the first layout and a second mask representing the second layout.