Photosensitive compound, photosensitive composition, resist pattern forming method, and device production process
AssigneeCanon Kabushiki Kaisha
InventorsToshiki Ito, Takako Yamaguchi
Life of this patent
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Abstract
A photosensitive compound has two or more structural units, in a molecule, represented by the following general formula (1): wherein R1 to R10 are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom; and X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group.
Claims13
A photosensitive compound comprising:
- two or more structural units, in a molecule, represented by the following general formula (1):
- wherein R1 to R10 are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom;
- and X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group.
A photosensitive compound comprising:
- two or more structural units, in a molecule, represented by the following general formula (2):
- wherein X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group.
A photosensitive compound comprising:
- two or more structural units, in a molecule, represented by the following general formula (3):
- wherein X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group.
A photosensitive compound comprising:
- two or more structural units, in a molecule, represented by the following general formula (4):
- wherein X is a substituted or unsubstituted phenylene group or a substituted or unsubstituted naphthylene group.
Polyhydroxystyrene comprising:
- hydrogen atoms of two or more phenolic hydroxyl groups substituted with a chemical group represented by the following general formula (5):
- wherein R1 to R10 are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom.
Carixarene comprising:
- hydrogen atoms of two or more phenolic hydroxyl groups substituted with a chemical group represented by the following general formula (5):
- wherein R1 to R10 are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom.
Novolak resin comprising:
- hydrogen atoms of two or more phenolic hydroxyl groups substituted with a chemical group represented by the following general formula (5):
- wherein R1 to R10 are selected from the group consisting of hydrogen atom, halogen atom, alkyl group, alkoxy group, phenyl group, naphthyl group, and alkyl group in which a part or all of hydrogen atoms are substituted with fluorine atom.
Dependencies are inferred from the claim text.