Non-volatile semiconductor memory device
AssigneeGenusion, Inc.
InventorsTaku Ogura, Natsuo Ajika
Life of this patent
Estimating the term…
Abstract
According to an one aspect of the present invention, it is provided a non-volatile semiconductor memory device comprising: a first N type well; a plurality of P type non-volatile memory cells arranged in matrix and formed in the N type well; a plurality of sub-bit lines, each of the sub-bit lines being connected to drains of the P type non-volatile memory cells in a respective one of columns of the matrix; a first P type well; and a plurality of N type selection transistors, each of the selection transistors selectively connecting a respective one of sub-bit lines to a corresponding one of main bit lines.
Claims44
A non-volatile semiconductor memory device comprising:
- a first N type well;
- a plurality of P type non-volatile memory cells arranged in matrix and formed in said N type well;
- a plurality of sub-bit lines, each of said sub-bit lines being connected to drains of said P type non-volatile memory cells in a respective one of columns of said matrix;
- a first P type well;
- and
- a plurality of N type selection transistors, each of said selection transistors selectively connecting a respective one of sub-bit lines to a corresponding one of main bit lines.
A non-volatile semiconductor memory device comprising:
- a P type non-volatile memory cell formed in an N type well, said P type non-volatile memory cell including a source, a drain, a charge accumulation layer and a control gate;
- a sub-bit line connected to said drain of said P type non-volatile memory cell;
- an N type selection transistor including a source, a drain and a control gate, said drain of said N type selection transistor being connected to said sub-bit line;
- and
- a well bias circuit to bias said N type well with a first voltage so that said sub-bit line is floated and boosted to a program inhibit voltage by a capacitive coupling between said N type well and said drain of said P type non-volatile memory cell.
A non-volatile semiconductor memory device comprising:
- first and second P type non-volatile memory cells each formed in an N type well, each of said first and second P type non-volatile memory cells including a source, a drain, a charge accumulation layer and a control gate;
- a sub-bit line connected to said drain of said first P type non-volatile memory cell and said drain of said second P type non-volatile memory cell;
- an N type selection transistor including a source, a drain and a control gate, said drain of said N type selection transistor being connected to said sub-bit line;
- and
- a source line connected to said source of said first P type non-volatile memory cell and said source of said second P type non-volatile memory cell;
- and
- a source line bias circuit to bias said source line with a program inhibit voltage so that said sub-bit line is biased to said program inhibit voltage by turning on said second P type non-volatile memory cell.
A non-volatile semiconductor memory device comprising:
- a P type non-volatile memory cell formed in an N type well, said P type non-volatile memory cell including a source, a drain, a charge accumulation layer and a control gate;
- a sub-bit line connected to said drain of said P type non-volatile memory cell;
- an N type selection transistor including a source, a drain and a control gate, said drain of said N type selection transistor being connected to said sub-bit line;
- a source line;
- a source line bias circuit to bias said source line with a program inhibit voltage;
- and
- a P type pre-charging transistor formed in said N type well for connecting said source line and said sub-bit line to pre-charge said sub-bit line to said program inhibit voltage and for disconnecting said sub-bit line from said source line so that said sub-bit line is floated.
A non-volatile semiconductor memory device comprising:
- an N type well for a plurality of memory cells formed within, said N type well being biased by an N well bias voltage though a first number (N1) of contacts;
- and
- a P type well for a plurality of selection transistors formed within, said P type well being biased by a P well bias voltage though a second number (N2) of contacts;
- wherein the first number (N1) is greater than the second number (N2).
A non-volatile semiconductor memory device comprising:
- a first memory block having a plurality of P type memory cells arranged in matrix shape formed in a first N type well;
- a second memory block having a plurality of P type memory cells arranged in matrix shape formed in a second N type well;
- and
- a plurality of selection transistors formed between said first N type well and said second N type well.
A non-volatile semiconductor memory device comprising:
- a memory block having a plurality of P type memory cells arranged in matrix formed in an N type well;
- a plurality of sub bit lines each of said sub bit lines being connected to corresponding P type memory cells in a column of said matrix;
- and
- a plurality of pre-charging transistors formed in said N type well, each of said pre-charging transistors pre-charges corresponding one of said sub bit lines with a program inhibit voltage.
Dependencies are inferred from the claim text.