System and a Method for Generating Periodic and/or Quasi-Periodic Pattern on a Sample

A method for generating at least one of a periodic and a quasi-periodic pattern on a sample by using an interference lithography technique, comprising:

• a) providing a photon source;
• b) providing a mask having a grating for generating a predetermined pattern;
• c) positioning said mask at a first distance from the photon source;
• d) providing a sample holder for holding the sample;
• e) positioning the sample at a second distance from the mask on a side facing away from the photon source,
• f) choosing the second distance to be in a range where the intensity distribution is substantially stationary and distance-invariant or varying the second distance in a continuous or discrete way to obtain a desired average intensity distribution on the surface;
• and
• g) illuminating the sample with radiation originating from the photon source and passing through the mask.