Inspection apparatus and method, and production method for pattern substrates
AssigneeLasertec Corporation
InventorHaruhiko Kusunose
Life of this patent
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AssigneeLasertec Corporation
InventorHaruhiko Kusunose
Estimating the term…
According to a first aspect of the present invention, there is provided an inspection apparatus including an objective lens, a reflected illumination optical system that illuminates a first area which is part of a field of view of the objective lens, a transmitted illumination optical system that illuminates the first area and a second area; an adjusting unit that adjusts positions on the sample of transmitted illumination light from the transmitted illumination optical system and reflected illumination light from the reflected illumination optical system; a first detector that detects a transmitted light transmitted by the sample and a reflected light reflected by the sample in the first area; and a second detector that detects through the objective lens a transmitted light transmitted by the sample in the second area.
An inspection apparatus which performs inspection using transmitted light transmitted by a sample and reflected light reflected by the sample, comprising:
An inspection method which performs inspection by detecting through an objective lens transmitted light transmitted by a sample and reflected light reflected by the sample, comprising the steps of:
Dependencies are inferred from the claim text.