Back to results
US 2008/0186472 A1Published application
Apparatus and method for inspecting a wafer
OwnerJae-Woo Park, Chung-Sam Jun +2inventors
InventorsJae-Woo Park, Chung-Sam Jun, Jang-Ik Park, Yu-Sin Yang
Life of this patent
Estimating the term…
Abstract
An apparatus for inspecting a wafer includes a light source, a detecting part and a signal analyzing part. The light source emits a light onto the wafer, and the detecting part detects a radiation light emitted from the wafer by the light and generates a signal. The signal analyzing part analyzes the signal generated by the detecting part and determines whether a defect has been formed on the wafer.
Claims32
An apparatus for inspecting a wafer, the apparatus comprising:
- a light source emitting a light onto the wafer;
- a detecting part detecting a radiation light emitted from the wafer caused by the light and generating a detection signal;
- a signal analyzing part analyzing the detection signal generated by the detecting part and determining whether a defect has been formed on the wafer.
A method for inspecting a wafer, the method comprising:
- emitting a light onto the wafer;
- generating a detection signal by detecting a radiation light emitted from the wafer by the light;
- determining whether a defect has been formed on the wafer by analyzing the generated detection signal.
Dependencies are inferred from the claim text.