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US 2008/0186438 A1Published application
Method and apparatus for alignment film, alignment film, and liquid crystal device
AssigneeCanon Kabushiki Kaisha
InventorsAkira Sakai, Toshiaki Aiba, Yohei Ishida
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Abstract
A first film is formed on a substrate by oblique deposition and thereafter a second film is formed on the first film by sputtering.
Claims9
A method for forming an alignment film of a liquid crystal, comprising:
- a step of forming a first film on a substrate by an oblique deposition method;
- and
- a step of forming a second film on the first film by a sputtering method.
A film forming apparatus for forming an alignment film of a liquid crystal, comprising:
- first means for evaporating a first material by heating a source of the first material;
- second means for evaporating a second material by sputtering a target of the second material;
- and
- a stage for mounting a substrate to obliquely deposit the first material evaporated by the first means and to deposit the second material evaporated by the second means onto the first material.
1 more element
An alignment film of a liquid crystal comprising:
- a first film formed on a substrate by an oblique deposition method;
- and
- a second film formed on said first film by a sputtering method.
A liquid crystal device comprising:
- a pair of substrates;
- an alignment film formed on an inner surface of each of said pair of substrates;
- and
- a liquid crystal disposed between said pair of substrates,
- wherein said alignment film comprises a first film formed by an oblique deposition method and a second film formed on the first film by a sputtering method.
2 more elements
Dependencies are inferred from the claim text.