Electro-optical device substrate, electro-optical device and electronic apparatus

Abstract

An electro-optical device substrate includes a substrate, a plurality of data lines, a plurality of scanning lines, pixel electrodes, and transistors. The plurality of data lines and the plurality of scanning lines intersect with each other in a display area formed on the substrate. The pixel electrodes are provided at positions corresponding to intersections of the plurality of data lines and the plurality of scanning lines. Each of the transistors includes a semiconductor layer and a gate electrode. The semiconductor layer has a channel region, a data line side source/drain region, a pixel electrode side source/drain region, a first junction region, and a second junction region. The channel region has a channel length along a first direction in the display area. The data line side source/drain region is electrically connected to a corresponding one of the data lines. The pixel electrode side source/drain region is electrically connected to a corresponding one of the pixel electrodes. The first junction region is formed between the channel region and the data line side source/drain region. The second junction region is formed between the channel region and the pixel electrode side source/drain region. The gate electrode includes a body portion, a first elongated portion, and a second elongated portion. The body portion is arranged in an upper layer than the semiconductor layer through a first insulating film and overlaps the channel region on the substrate as viewed in plan. The first elongated portion extends from the body portion by a side of the semiconductor layer along the first direction to a side of the second junction region so as to adjoin at least the second junction region. The second elongated portion extends from at least a portion of the first elongated portion along a second direction that intersects with the first direction, and is electrically connected to a corresponding one of the scanning lines. A longitudinal groove is formed in the first insulating film at a portion that overlaps the first elongated portion on the substrate as viewed in plan so as to extend along the second junction region. The first elongated portion has an inner groove portion that is at least partly formed inside the groove.

Dependencies are inferred from the claim text.