Loading patent…
AssigneeGeneral Electric Company
InventorDeeder Aurongzeb
Estimating the term…
The invention relates to an electrode having a nano-hollow array on the surface thereof, the nano-hollow array comprising a plurality of nano-pores or nano-balls, each pore having a diameter of less than 500 nm, formed by a process comprising depositing a uniform metal film on the electrode structure surface at a rate of 2 Å per second or less, annealing the metal film under rapid anneal conditions at a temperature within about 100 degrees of the melting point of the metal film and without subjecting the metal film to a temperature ramp-up to create metal droplets, and anodizing and over-anodizing the metal droplets in the presence of an anodization agent for the metal at from 20 to 200 volts at 0.1 to 2 amps to create nano-pores in the metal droplets or nano-balls to, creating increased surface area and increased electric field around the electrode which enhances speed of fill gas ionization.
An electrode having a nano-hollow array on the surface thereof, the nano-hollow array comprising a plurality of nano-pores, each pore having a diameter of from 10 nm to 500 nm and having side walls that are rough in nature, and formed from a metal film deposited on the electrode surface.
A process for creating a nano-hollow array on an electrode structure comprising:
A process for decreasing the operating temperature of an electrode in a high intensity lamp by increasing electrode surface area, the process comprising creating a nano-hollow array on the surface of the electrode by first depositing a low melting point metal film on at least a portion of the surface of the electrode, then subjecting the metal film to rapid anneal processing followed by anodizing to generate metal droplets from the metal film, the droplets having pore structures with rough side walls, and further processing the anodized surface to extend the pore structures into the electrode.
Dependencies are inferred from the claim text.