Charged particle beam apparatus
AssigneeHitachi High-Technologies Corporation
InventorsNoritsugu Takahashi, Muneyuki Fukuda, Hiroyuki Ito, Atsuko Fukada, Masashi Sakamoto, Satoshi Takada
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AssigneeHitachi High-Technologies Corporation
InventorsNoritsugu Takahashi, Muneyuki Fukuda, Hiroyuki Ito, Atsuko Fukada, Masashi Sakamoto, Satoshi Takada
Estimating the term…
A technology whereby removal of magnetic hysteresis is enabled in short time in parallel with a process for stage transfer, and so forth. There is executed a magnetic hysteresis removal sequence whereby current for exciting an electromagnetic coil prior to acquisition of an image is always set to a predetermined variation value against a target value, thereby obtaining information on an image, and so forth, when a diameter of a primary electron beam, converged on the specimen, becomes smaller than dimensions displayed by one pixel of an image to be acquired.
A charged particle beam apparatus including:
A charged particle beam apparatus including:
A defect-review system for acquiring a scanning electron beam image on the basis of information on a position of a defect existing on a semiconductor wafer, said defect-review system comprising:
Dependencies are inferred from the claim text.