Control of Critical Dimensions of Etched Structures on Semiconductor Wafers
AssigneeInternational Business Machines Corporation
InventorsWilliam B. Bornstein, Anthony Cappa Spielberg
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Abstract
A system for real-time monitoring and control of critical dimensions during semiconductor wafer fabrication is provided. The system measures structures in situ, that is, as they are being etched onto a wafer layer.
Claims13
-8. (canceled)
A computer program product comprising a computer usable medium including computer usable program code for real-time monitoring of critical dimensions of structures in a semiconductor wafer fabrication system, said computer program product including:
- computer usable program code for measuring critical dimensions of a structure as the structure is being etched.
A semiconductor wafer fabrication system for real-time monitoring of critical dimensions of a structure, comprising:
- measuring mechanism for measuring critical dimensions of a structure as the structure is etched.
Dependencies are inferred from the claim text.