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US 2008/0184811 A1Published application
Method for measuring the flow rate of a medium
AssigneeZylum Beteiligungsgesellschaft mbH & Co. Patent II KG
InventorGerd STANGE
Life of this patent
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Abstract
A method is provided for measuring the flow rate of a medium in a volume subjected to a magnetic field. The electrical resistance of a semiconductor arranged adjacent to the volume is measured, and the flow rate of the medium is computed from this electrical resistance.
Claims11
A method for measuring a flow rate of a medium in a volume permeated by a magnetic field, the method comprising measuring an electrical resistance of at least one semiconductor arranged adjacent to the volume, and computing the flow rate of the medium from the electrical resistance.
Dependencies are inferred from the claim text.