Chemically amplified resist composition
AssigneeSumitomo Chemical Company, Limited
InventorsKaoru Araki, Satoshi Yamaguchi, Satoshi Yamamoto
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AssigneeSumitomo Chemical Company, Limited
InventorsKaoru Araki, Satoshi Yamaguchi, Satoshi Yamamoto
Estimating the term…
A chemically amplified resist composition comprising: (A) a salt represented by the formula (I): wherein R21 represents a C1-C30 hydrocarbon group which may be substituted, and at least one —CH2— in the hydrocarbon group may be substituted by —CO— or —O—, Q1 and Q2 each independently represent a fluorine atom or a C1-C6 perfluoroalkyl group, and A+ represents at least one organic cation selected from a cation represented by the formula (Ia): wherein P1, P2 and P3 each independently represent a C1-C30 alkyl group which may be substituted with at least one selected from a hydroxyl group, a C3-C12 cyclic hydrocarbon group and a C1-C12 alkoxy group, or a C3-C30 cyclic hydrocarbon group which may be substituted with at least one selected from a hydroxyl group and a C1-C12 alkoxy group, a cation represented by the formula (Ib): wherein P4 and P5 each independently represent a hydrogen atom, a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, and a cation represented by the formula (Ic): wherein P10, P11, P12, P13, P14, P15, P16, P17, P18, P19, P20 and P21 each independently represent a hydrogen atom, a hydroxyl group, a C1-C12 alkyl group or a C1-C12 alkoxy group, B represents a sulfur or oxygen atom and m represents 0 or 1, (B) a salt represented by the formula (II): A′+−O3S-Q3 (II) wherein Q3 represents a C1-C10 perfluoroalkyl group or a C4-C8 perfluorocycloalkyl group, and A′+ represents an organic cation represented by the formula (IIa): wherein P6 and P7 each independently represent a C1-C12 alkyl group or a C3-C12 cycloalkyl group, or P6 and P7 are bonded to form a C3-C12 divalent acyclic hydrocarbon group which forms a ring together with the adjacent S+, and at least one —CH2— in the divalent acyclic hydrocarbon group may be substituted with —CO—, —O— or —S—, P8 represents a hydrogen atom, P9 represents a C1-C12 alkyl group, a C3-C12 cycloalkyl group or an aromatic group which may be substituted, or P8 and P9 are bonded to form a divalent acyclic hydrocarbon group which forms a 2-oxocycloalkyl group together with the adjacent —CHCO—, and at least one —CH2— in the divalent acyclic hydrocarbon group may be replaced with —CO—, —O— or —S—; and (C) a resin which contains a structural unit having an acid-labile group and which itself is insoluble or poorly soluble in an aqueous alkali solution but becomes soluble in an aqueous alkali solution by the action of an acid.
A chemically amplified resist composition comprising:
Dependencies are inferred from the claim text.