Photosensitive Composition Containing Organic Fine Particles
AssigneesNational University Corporation the University of Electro-Communications, Nissan Chemical Industries, Ltd.
InventorsYasuo Tomita, Kouji Furushima, Kazuhiko Akimoto, Katsumi Chikama, Motohiko Hidaka, Keisuke Odoi
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Abstract
It is an object of the present invention to provide a photosensitive composition capable of forming permanent holograms with low light scattering loss and high diffraction efficiency, and a method for forming a pattern. A photosensitive composition and a pattern formation method using the photosensitive composition are characterized in that the photosensitive composition used to form a pattern by pattern exposure includes: (a) a polymerizable compound, (b) a photopolymerization initiator, and (c) organic fine particles.
Claims24
A photosensitive composition, comprising:
- (a) a polymerizable compound;
- (b) a photopolymerization initiator;
- and (c) organic fine particles.
A photosensitive composition characterized by comprising:
- (a) a polymerizable compound;
- (b) a photopolymerization initiator;
- and (c) organic fine particles, wherein a spatial refractive-index modulation pattern is formed through movement of the polymerizable compound and the organic fine particles by pattern exposure.
Dependencies are inferred from the claim text.