Inner lining structure for photoresistant collecting devices
AssigneeLite-On Semiconductor Corp.
InventorsChen-Hsiang Hung, Chih-Ming Lian, Hsun-Min Lee
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Abstract
An inner lining structure for a photoresistant collecting device includes a body, a receiving groove and a through-hole. A periphery of the body is a circular arced surface. A receiving groove is formed by concaving a top of the body downwards and the upper end is shaped like an opening. A through-hole is arranged in a center of the body and penetrates a bottom surface of the receiving groove and a bottom of the body. Based on the above assembly, the present invention engages with a sucking plate of a photoresistant coater and ensures that photoresistant filaments cannot adhere to the bottom of a wafer when the wafer is operated at a high speed.
Claims5
An inner lining structure for a photoresistant collecting device, comprising:
- a body, having a periphery which has a circular arced surface that gradually shrinks in size as it gets higher;
- a receiving groove, formed by concaving a top of the body downwards and having an upper end shaped like an opening;
- and
- a through-hole, arranged in a center of the body and penetrating a bottom surface of the receiving groove and a bottom of the body.
Dependencies are inferred from the claim text.