Method for forming srtio3 film
AssigneeTokyo Electron Limited
InventorsYumiko KAWANO, Akinobu Kakimoto, Hidekimi Kadokura, Shintaro Higashi
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AssigneeTokyo Electron Limited
InventorsYumiko KAWANO, Akinobu Kakimoto, Hidekimi Kadokura, Shintaro Higashi
Estimating the term…
A method is used for forming an SrTiO3 film on a substrate placed and heated inside a process chamber while supplying a gaseous Ti source material, a gaseous Sr source material, and a gaseous oxidizing agent into the process chamber. Sr(C5(CH3)5)2 is used as the Sr source material. The method performs a plurality of cycles to form the SrTiO3 film. Each cycle sequentially includes supplying the gaseous Ti source material into the process chamber and thereby adsorbing it onto the substrate; supplying the gaseous oxidizing agent into the process chamber and thereby decomposing the Ti source material thus adsorbed and forming a Ti-containing oxide film; supplying the gaseous Sr source material into the process chamber and thereby adsorbing it onto the Ti-containing oxide film; and supplying the gaseous oxidizing agent into the process chamber and thereby decomposing the Sr source material thus adsorbed and forming an Sr-containing oxide film.
An SrTiO3 film forming method for forming an SrTiO3 film on a substrate placed and heated inside a process chamber while supplying a gaseous Ti source material, a gaseous Sr source material, and a gaseous oxidizing agent into the process chamber, wherein Sr(C5(CH3)5)2 is used as the Sr source material, and the method is arranged to perform a plurality of cycles to laminate thin films respectively formed by the cycles, thereby forming the SrTiO3 film with a predetermined thickness, each of the cycles sequentially comprising:
A computer readable storage medium that stores a control program for execution on a computer for controlling a film forming apparatus, wherein the control program, when executed, causes the computer to control the film forming apparatus to perform an SrTiO3 film forming method for forming an SrTiO3 film on a substrate placed and heated inside a process chamber while supplying a gaseous Ti source material, a gaseous Sr source material, and a gaseous oxidizing agent into the process chamber, wherein Sr(C5(CH3)5)2 is used as the Sr source material, and the method is arranged to perform a plurality of cycles to laminate thin films respectively formed by the cycles, thereby forming the SrTiO3 film with a predetermined thickness, each of the cycles sequentially comprising:
Dependencies are inferred from the claim text.