Maskless euv projection optics
AssigneeOptical Research Associates
InventorJames P. McGuire
Life of this patent
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Abstract
Various embodiments provide projection optics comprise a plurality of mirrors that provide high demagnification of, for example, about one hundred times or more. The projection optics may be used for photolithography processes, such as extreme ultraviolet lithography processes, to pattern microstructures.
Claims29
A maskless extreme ultraviolet photolithography system comprising a reflective relay comprising:
- at least a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, a sixth mirror, a seventh mirror and an eighth mirror arranged in an optical path from an object plane to an image plane for imagining a spatial light modulator in said object plane into a wafer in said image plane, said mirrors having a shape and location with respect to each other within the optical path such that said reflective relay yields a reduction ratio of at least about 100 times.
The system of 1, wherein the shape and location of said minors are such that said reflective relay has a reduction ratio of at least about 300 times.
A method of patterning a semiconductor wafer, comprising:
- modulating extreme ultraviolet light to form an object pattern;
- reflecting said modulated extreme ultraviolet light from a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, a sixth mirror, a seventh mirror and an eighth mirror to form an image pattern;
- and
- demagnifying said image pattern by at least 100 times relative to said object pattern, and
- exposing said semiconductor wafer with said image pattern.
An EUV optical projection system, comprising:
- an extreme ultraviolet light source;
- an array of spatial light modulators configured to modulate light generated from the light source to form an object pattern;
- and
- at least eight mirrors configured to image said object pattern to form an image pattern on a wafer and to reduce said image pattern by at least about 100 times relative to said object pattern.
An optical imaging system comprising a reflective relay comprising:
- at least a first mirror, a second mirror, a third mirror, a fourth mirror, a fifth mirror, a sixth mirror, a seventh mirror and an eighth mirror arranged in an optical path from an object plane to an image plane for imaging a spatial light modulator in said object plane onto a wafer in said image plane, said mirrors having a shape and location with respect to each other within the optical path such that said reflective relay yields a reduction ratio of at least about 100 times.
Dependencies are inferred from the claim text.