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US 2008/0175348 A1Published application
Nanometer-scale lithography using extreme ultraviolet/soft x-ray laser interferometry
AssigneeColorado State University Research Foundation
InventorsMario C. Marconi, Przemyslaw W. Wachulak, Carmen S. Menoni, Jorge J. Rocca
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Abstract
Direct patterning of nanometer scale features by interferometric lithography using a 46.9 nm laser is described. Multiple exposures using a Lloyd's mirror interferometer permitted printing of arrays having 60 nm FWHM features.
Claims20
Apparatus for nanometer-scale lithographic patterning of a photosensitive surface of a sample, comprising in combination:
- a chamber capable of being evacuated;
- pump means for evacuating said chamber to a chosen pressure;
- a source of pulsed laser radiation having a chosen wavelength in the range between 1 nm and 100 nm, and a chosen fluence, wherein the pulsed laser radiation is directed into said chamber;
- means disposed within said chamber for generating a chosen interference pattern at a chosen reference plane from the pulsed laser radiation and perpendicular thereto;
- and
- means for positioning said sample within said chamber at the chosen reference plane such that the photosensitive surface is exposed to the interference pattern, whereby the interference pattern is generated on the photosensitive surface of said sample.
3 more elements
A method for nanometer-scale lithographic patterning of a photoresist surface of a sample, comprising the steps of:
- directing pulsed laser radiation having a chosen wavelength in the range between 1 nm and 100 nm and a chosen intensity into a vacuum chamber below atmospheric pressure;
- generating a chosen interference pattern at a chosen reference plane from the pulsed laser radiation and perpendicular thereto;
- and
- exposing the photosensitive surface of the sample to the interference pattern in the reference plane in the vacuum chamber, whereby the interference pattern is generated on the photoresist surface of said sample.
1 more element
Dependencies are inferred from the claim text.