Interferometric method for improving the resolution of a lithographic system

A method for writing an arbitrary, two-dimensional pattern using interferometric lithography comprising the steps of:

• creating a pixel array defined by a number of pixels having specific coordinates;
• mapping pixel information based on the desired pattern, the pixel information including a list of which pixels are activated to define the desired two-dimensional pattern;
• controlling a relative strength of each pixel for indicating a feature height of a portion of the desired two-dimensional pattern;
• controlling a degree that one pixel is shifted in an x-direction and a y-direction relative to original coordinates of the pixel in order to define the desired two-dimensional pattern pixel by pixel;
• and
• writing the two-dimensional pattern pixel by pixel on a recording material.

A system for writing an arbitrary, two-dimensional pattern using interferometric lithography on a recording material comprising:

• a source of a light beam having a prescribed wavelength;
• a program that creates a pixel array defined by a number of pixels having specific coordinates and permits the two-dimensional pattern to be mapped on the pixel array;
• a first means for splitting the light beam into a first beam that carries horizontal (x) information of the pixel and a second beam that carries vertical (y) information of the pixel;
• a second means for splitting the second beam into two x-beams and splitting the third beam into two y-beams;
• and
• a third means for causing the two y-beams to interfere in a vertical manner and causing the two x-beams to interfere in a horizontal manner, each of the four beams reaching the recording material at the same point and same time to create pixel by pixel the arbitrary two-dimensional pattern having enhanced resolution.

A system for writing an arbitrary, two-dimensional pattern using interferometric lithography on a recording material comprising:

• a source of a light beam having a prescribed wavelength;
• a program that creates a pixel array defined by a number of pixels having specific base coordinates and permits the two-dimensional pattern to be mapped on the pixel array, wherein each pixel has a corresponding A coefficient, α coefficient value and the β coefficient, the A coefficient value representing the relative intensity of the pixel, the α coefficient value representing the degree that the pixel is shifted horizontally (x-direction) relative to base coordinates of the pixel, the β coefficient value representing the degree that the pixel is shifted vertically (y-direction) relative to the base coordinates of the pixel, wherein the shifting of one or more pixels forms one or more non-linear features of the pattern, wherein based on inputted information regarding the desired two-dimensional pattern, the program determines the corresponding A coefficient value, α coefficient value and the β coefficient value needed for each pixel to form the two-dimensional pattern pixel by pixel;
• and
• a device that communicates with the program and writes the two-dimensional pattern on a recording material using classical interferometric lithography techniques that act on the light beam.

A method for writing an arbitrary, two-dimensional pattern on a recording material using interferometric lithography and classical techniques comprising the steps of:

• creating a pixel array defined by a number of main pixels having specific coordinates;
• dividing each main pixel into a subarray of pixels to permit a specific region within one main pixel to be identified by subarray coordinates to permit finer patterns to be established with precise detail on the recording material;
• generating and treating a light beam classically as a composite electromagnetic wave, the light beam being divided into first and second light beams that carry horizontal (x) information and third and fourth light beams that carry vertical (y) information;
• and
• interfering the first and second beams in a horizontal manner on the recording material and interfering the third and fourth beams in a vertical manner on the recording material such that each of the four beams reaches the recording material at the same point same time to write the two-dimensional pattern pixel by pixel.