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US 2008/0174759 A1Published application
Microlithographic projection exposure apparatus
AssigneeCarl Zeiss SMT GmbH
InventorKarl-Heinz Schuster
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Abstract
Microlithographic projection exposure apparatuses, as well as related components, subsystems and methods are disclosed.
Claims20
A projection exposure apparatus, comprising:
- a birefringent retardation arrangement comprising a retardation element, the retardation element comprising:
- a first subelement comprising an optically positively uniaxial crystal material which has a first optical crystal axis;
- and
- a second subelement comprising an optically negatively uniaxial crystal material which has a second optical crystal axis and which is arranged along an element axis of the retardation element before or after the first subelement,
- wherein:
- the first crystal axis and the second crystal axis are disposed in a plane perpendicular to an optical axis of the projection exposure apparatus;
- the first crystal axis and the second crystal axis are either arranged at an angle of 0°±5° relative to each other or at an angle of 90°±5° relative to each other;
- and
- the projection exposure apparatus is a microlithographic projection exposure apparatus.
6 more elements
An arrangement, comprising:
- a retardation element, the retardation element comprising:
- a first subelement comprising an optically positively uniaxial crystal material which has a first optical crystal axis;
- and
- a second subelement comprising an optically negatively uniaxial crystal material which has a second optical crystal axis and which is arranged along an element axis of the retardation element before or after the first subelement;
- wherein:
- the first crystal axis and the second crystal axis are respectively disposed in a plane perpendicular to an optical axis of the arrangement;
- The first crystal axis and the second crystal axis are either arranged at an angle of 0°±5° relative to each other or at an angle of 90°±5° relative to each other;
- the first subelement and/or the second subelement have a thickness profile varying transversely with respect to the optical system axis;
- and
- the arrangement is a birefringent retardation arrangement.
7 more elements
An arrangement, comprising:
- a retardation element, the retardation element comprising:
- a first subelement comprising an optically positively uniaxial crystal material which has a first optical crystal axis;
- and
- a second subelement comprising an optically negatively uniaxial crystal material which has a second optical crystal axis and which is arranged along an element axis of the retardation element before or after the first subelement;
- wherein:
- the first crystal axis and the second crystal axis are respectively disposed in a plane perpendicular to an optical axis of the arrangement;
- the first crystal axis and the second crystal axis are either arranged at an angle of 0°±5° relative to each other or at an angle of 90°±5° relative to each other;
- the optically negatively uniaxial crystal material is selected from the group consisting of sapphire (Al2O3) and lanthanum fluoride (LaF3);
- and
- the arrangement is a birefringent retardation arrangement.
7 more elements
An arrangement, comprising:
- a retardation element, the retardation element comprising:
- a first subelement comprising an optically positively uniaxial crystal material which has a first optical crystal axis;
- and
- a second subelement comprising an optically negatively uniaxial crystal material which has a second optical crystal axis and which is arranged along an element axis of the retardation element before or after the first subelement;
- wherein:
- the first crystal axis and the second crystal axis are respectively disposed in a plane perpendicular to an optical axis of the arrangement;
- the first crystal axis and the second crystal axis are either arranged at an angle of 0°±5° relative to each other or at an angle of 90°±5° relative to each other;
- wherein the optically positively uniaxial crystal material comprises magnesium fluoride (MgF2);
- and
- the arrangement is a birefringent retardation arrangement.
7 more elements
Dependencies are inferred from the claim text.