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US 2008/0174758 A1Published application
Replacement device for an optical element
AssigneeCarl Zeiss SMT GmbH
InventorsBernhard Gellrich, Ulrich Weber
Life of this patent
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Abstract
Replacement devices for at least one replaceable optical element mounted at least indirectly in a lithographic projection exposure apparatus are disclosed. Lithography objectives and illumination systems are also disclosed. Methods for positioning a replaceable optical element within a lithographic projection exposure apparatus of this type, and methods for replacing a replaceable optical element within a lithographic projection exposure apparatus via a replacement device are also disclosed.
Claims29
A system, comprising:
- an apparatus part of a lithographic projection exposure apparatus, the apparatus part comprising:
- a housing;
- a holding structure configured to hold an optical element in the apparatus part, the holding structure being different from the housing;
- and
- a fixing device configured to fix the optical element relative to the holding structure, the holding structure being at least approximately decoupled from effective forces of the fixing device;
- and
- a receptacle for the optical element, the receptacle being at least indirectly mounted in the lithographic projection exposure apparatus,
- wherein the housing has an opening through which the receptacle can be moved from being inside the housing to being outside the housing.
5 more elements
A system, comprising:
- an apparatus part of a lithographic projection exposure apparatus, the apparatus part comprising:
- a housing;
- a holding structure configured to hold an optical element in the apparatus part, the holding structure being different from the housing;
- and
- a fixing device configured to fix the optical element relative to the holding structure, the holding structure being at least approximately decoupled from effective forces of the fixing device;
- and
- a receptacle for the optical element, the receptacle being at least indirectly mounted in the lithographic projection exposure apparatus,
- wherein the housing has an opening through which the receptacle can be moved from being inside the housing to being outside the housing, and the system is an illumination system for microlithography.
5 more elements
Dependencies are inferred from the claim text.