Imaging device in a projection exposure machine

An apparatus, comprising:

• a manipulator configured to be used with an optical element;
• and
• a moveable part,
• wherein the manipulator is fitted on the movable part, where the movable part and a fixed part are connected via at least three bar elements that are linked via joints to the movable part and to the fixed part, and that are arranged at least approximately in one plane, and via three linear drives whose movement axes are at least approximately perpendicular to the plane and whose points of intersection with the plane form a triangle.

An apparatus, comprising:

• a manipulator configured to be used with an optical element;
• and
• a moveable part,
• wherein the manipulator is fitted to the movable part, where the movable part and a fixed part are connected via an annular disk that is linked via circumferential solid joints to the movable part and to the fixed part, and via three linear drives whose movement axes are at least approximately perpendicular to the plane of the annular disk and whose points of intersection with the plane form a triangle.

A system, comprising:

• an optical element;
• a frame;
• a mounting apparatus which couples the optical element to the frame, the mounting apparatus comprising a first portion fixedly attached to the frame, a second portion fixedly attached to the optical element, and a manipulator which couples the first portion to the second portion,
• wherein the manipulator is configured so that during operation it varies the position of the optical element with respect to the frame, the manipulator providing a resolution of motion of the first portion relative to the second portion and a range of motion of the first portion relative to the second portion, where the ratio of the resolution to the range is 1:75,000 or more, and the system is a microlithography projection system.

A system, comprising:

• an optical element;
• a frame;
• a mounting apparatus which couples the optical element to the frame, the mounting apparatus comprising a manipulator configured so that during operation it varies the position of the optical element with respect to the frame, the manipulator providing a resolution of motion of the first portion relative to the second portion and a range of motion of the first portion relative to the second portion, where the ratio of the resolution to the range is 1:75,000;
• and
• one or more sensors configured so that during operation the sensors monitor a position of the optical element relative to the frame,
• wherein the system is a microlithography projection system.