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US 2008/0174751 A1Published application
Contamination barrier and lithographic apparatus
AssigneeASML Netherlands B.V.
InventorLambertus Adrianus Van Den Wildenberg
Life of this patent
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Abstract
A rotatable contamination barrier for use with an extreme ultraviolet radiation system includes a blade structure configured to trap contaminant material coming from a radiation source, and an eccentric mass element displaced relative to a central axis of rotation to balance the blade structure when the blade structure is rotated about the central axis.
Claims25
A rotatable contamination barrier for use with an extreme ultraviolet radiation system, the barrier comprising:
- a blade structure configured to trap contaminant material coming from a radiation source;
- and
- an eccentric mass element displaced relative to a central axis of rotation to balance the blade structure when the blade structure is rotated about the central axis.
A lithographic apparatus, comprising:
- a rotatable contamination barrier configured to receive radiation from a radiation source, the contamination barrier comprising
- a blade structure configured to trap contaminant material coming from the radiation source, and
- an eccentric mass element displaced relative to a central axis of rotation to balance the blade structure when the blade structure is rotated about the central axis;
- an illumination system configured to condition the beam of radiation;
- a support constructed to support a patterning device, the patterning device being capable of imparting the radiation with a pattern in its cross-section to form a patterned radiation beam;
- a substrate table constructed to hold a substrate;
- and
- a projection system configured to project the patterned radiation beam onto a target portion of the substrate.
5 more elements
Dependencies are inferred from the claim text.