Liquid recovery system, immersion exposure apparatus, immersion exposing method, and device fabricating method
AssigneeNikon Corporation
InventorHiroyuki Nagasaka
Life of this patent
Estimating the term…
Abstract
A liquid recovery system is used by an immersion exposure apparatus. The liquid recovery system is provided with: a first opening; a gap portion that is provided so that a liquid on an object that opposes the first opening can flow into the gap portion through the first opening; a liquid recovery part that suctions, through a porous member, at least part of the liquid that flows into the gap portion; and a second opening that is different from the first opening. The gap portion is open to the atmosphere through the second opening.
Claims31
A liquid recovery system that is used by an immersion exposure apparatus, comprising:
- a first opening;
- a gap portion into which, through the first opening, a liquid on an object that opposes the first opening can flow;
- a liquid recovery part that suctions, through a porous member, at least part of the liquid that flows into the gap portion;
- and
- a second opening that is different from the first opening;
- wherein,
- the gap portion is open to the atmosphere through the second opening.
An immersion exposure apparatus that exposes a substrate, comprising:
- an optical member, which comprises an emergent surface that emits exposure light;
- and
- a liquid recovery system that comprises:
- a first opening;
- a second opening that is different from the first opening;
- a gap portion into which, through the first opening, a liquid on an object that opposes the first opening can, flow;
- and
- a liquid recovery part that suctions, through a porous member, at least part of the liquid that flows into the gap portion, wherein the gap portion is open to the atmosphere through the second opening.
Dependencies are inferred from the claim text.