Apparatus for supporting substrate, apparatus for measuring surface potential, apparatus for measuring film thickness, and apparatus for inspecting substrate

A surface potential measuring apparatus for measuring a surface potential of a substrate, comprising:

• a substrate supporting apparatus comprising a first fluid ejection part having a first porous member for ejecting a first fluid which is a gas around a target region on one main surface of a substrate, a second fluid ejection part which is positioned opposite to said first fluid ejection part and has a second porous member for ejecting a second fluid onto the other main surface of said substrate, to support said substrate between said first porous member and said second porous member in a noncontact manner, a movement control part which is in contact with a perimeter part of said substrate and controls movement of said substrate in a direction parallel to said one main surface, and a moving mechanism for shifting said target region by moving said first fluid ejection part relatively to said substrate along said one main surface of said substrate;
• a measuring part having a probe which is attached to said first fluid ejection part of said substrate supporting apparatus and is opposite to said target region on said substrate;
• and
• an operation part for obtaining a surface potential of said target region on the basis of an output from said measuring part.

A film thickness measuring apparatus for measuring a thickness of a film formed on a substrate, comprising:

• a substrate supporting apparatus comprising a first fluid ejection part having a first porous member for ejecting a first fluid around a target region on one main surface of a substrate, a second fluid ejection part which is positioned opposite to said first fluid ejection part and has a second porous member for ejecting a second fluid onto the other main surface of said substrate, to support said substrate between said first porous member and said second porous member in a noncontact manner, a movement control part which is in contact with a perimeter part of said substrate and controls movement of said substrate in a direction parallel to said one main surface, and a moving mechanism for shifting said target region by moving said first fluid ejection part relatively to said substrate along said one main surface of said substrate;
• a light source part which is attached to said first fluid ejection part of said substrate supporting apparatus and emits a light toward said target region on said substrate in a state where said light is inclined to said target region;
• a receiving part which is attached to said first fluid ejection part and receives a reflected light reflected on said target region to acquire a polarization state of said reflected light;
• and
• an operation part for obtaining a thickness of a film in said target region on the basis of said polarization state acquired by said receiving part.

A film thickness measuring apparatus for measuring a thickness of a film formed on a substrate, comprising:

• a substrate supporting apparatus comprising a first fluid ejection part having a first porous member for ejecting a first fluid around a target region on one main surface of a substrate, a second fluid ejection part which is positioned opposite to said first fluid ejection part and has a second porous member for ejecting a second fluid onto the other main surface of said substrate, to support said substrate between said first porous member and said second porous member in a noncontact manner, a movement control part which is in contact with a perimeter part of said substrate and controls movement of said substrate in a direction parallel to said one main surface, and a moving mechanism for shifting said target region by moving said first fluid ejection part relatively to said substrate along said one main surface of said substrate;
• a light source part which is attached to said first fluid ejection part of said substrate supporting apparatus and emits a light toward said target region on said substrate;
• a receiving part which is attached to said first fluid ejection part and receives a reflected light reflected on said target region;
• and
• an operation part for obtaining a thickness of a film in said target region by spectroscopic reflectometry on the basis of an output from said receiving part.

A substrate inspection apparatus for inspecting a substrate, comprising:

• a substrate supporting apparatus comprising a first fluid ejection part having a first porous member for ejecting a first fluid around a target region on one main surface of a substrate, a second fluid ejection part which is positioned opposite to said first fluid ejection part and has a second porous member for ejecting a second fluid onto the other main surface of said substrate, to support said substrate between said first porous member and said second porous member in a noncontact manner, a movement control part which is in contact with a perimeter part of said substrate and controls movement of said substrate in a direction parallel to said one main surface, and a moving mechanism for shifting said target region by moving said first fluid ejection part relatively to said substrate along said one main surface of said substrate;
• a light source part which is attached to one of said first fluid ejection part and said second fluid ejection part of said substrate supporting apparatus and emits a light toward said target region on said substrate;
• a receiving part which is attached to the other of said first fluid ejection part and said second fluid ejection part and receives a light passing through said target region;
• and
• an operation part for performing inspection or measurement on said target region on the basis of an output from said receiving part.