Back to results
US 2008/0173339 A1Published application
Method for cleaning semiconductor device
OwnerYen-Wu HSIEH, Hui-Hsiung Tuaninventors
Life of this patent
Estimating the term…
Abstract
A method for cleaning semiconductor device is disclosed. The steps include providing a mask-protective device, providing a mask with a defined pattern, and combining the mask-protective device with the cleaned mask layer, such that the space between the mask-protective device and the mask layer can fill with the cleaning gas after combining process. Thus, the mask layer would not be polluted by the particle is generated from the environment, such that the resolution of the image and the reliability can be increased.
Claims7
A device for cleaning semiconductor device, said device comprising:
- a stage;
- a chamber with a vent hole, said chamber with said vent hole locating above on said stage, and a mask-protective device and a mask with a pattern locating within said chamber with said vent hole, wherein the space is between said mask with said pattern and said mask-protective device;
- and
- a cleaning device, said cleaning device supplying a purge gas that introducing through said vent hole of said chamber into said chamber.
1 more element
Dependencies are inferred from the claim text.